APPLICATION
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DRY FILM TYPE
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THICKNESS (mils)
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MAIN FEATURES
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- Copper, tin, plating
- Print/Tent & Etch
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Ordyl Alpha 300
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1.2 (Alpha 330)
1.6 (Alpha 340)
2.0 (Alpha 350)
3.0 (Alpha 375)
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- Extreme resistance in alkaline solutions
- High resistance in Ni/Au Plating
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Ordyl Alpha 800
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1.0 (Alpha 825)
1.2 (Alpha 830)
1.6 (Alpha 840)
2.0 (Alpha 850)
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- Extremely flexible and high conformability
- Easy stripping with small flake size
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Ordyl Alpha 900
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0.8 (Alpha 920)
1.2 (Alpha 930)
1.6 (Alpha 940)
2.0 (Alpha 950)
2.4 (Alpha 960)
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- Extremely flexible and high conformability
- Good through cure polymerization
- Easy stripping with small flake size
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Ordyl AM 100
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1.2 (AM 130)
1.6 (AM 140)
2.0 (AM 150)
3.0 (AM 175)
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- Excellent adhesion properties
- High exposure speed
- High flexibility and conformability
- Alkaline resistance
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Ordyl AR 200S
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1.6 (AR 240S)
2.0 (AR 250S)
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- High flexibility and conformability
- Alkaline resistance
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Ordyl FLR 4000
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1.2 (FLR 4030)
1.6 (FLR 4040)
2.0 (FLR 4050)
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- Excellent adhesion properties
- High exposure speed
- High flexibility and conformability
- Very small flake size
- Copper, tin, plating
- Print/Tent & Etch
- LDI exposure
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- Copper, tin, plating
- Print/Tent & Etch
- LDI exposure
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Ordyl Alpha 900NDI
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0.8 (Alpha 920NDI)
1.2 (Alpha 930NDI)
1.6 (Alpha 940NDI)
2.0 (Alpha 950NDI)
2.4 (Alpha 960NDI)
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- Absence of developing sludge
- Very good through cure polymerization also with LDI exposure machine over 50µm resist thickness
- Easy stripping with small flake size
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Ordyl AM 100DI
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0.6 (AM 115DI)
0.8 (AM 120DI)
1.2 (AM 130DI)
1.6 (AM 140DI)
2.0 (AM 150DI)
2.4 (AM 160DI)
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- Excellent through cure polymerization also with LDI exposure machine over 50µm resist thickness
- Excellent adhesion properties due to special adhesion promoter
- Very High Photospeed
- High flexibility and conformability
- Alkaline resistance
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Ordyl FLR 1000
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1.2 (FLR 1030)
1.6 (FLR 1040)
2.0 (FLR 1050)
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- Excellent through cure polymerization also with LDI exposure machine over 50µm resist thickness
- Excellent adhesion properties due to special adhesion promoter
- High Photospeed
- High flexibility and conformability
- Very small flake size
- Copper, tin, plating
- Print/Tent & Etch
- 405nm LDI exposure
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-
Copper, tin, plating
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Print/Tent & Etch
- 405nm LDI exposure
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Ordyl AM 400
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1.2 (AM 430)
1.6 (AM 440)
2.0 (AM 450)
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- Extremely short exposure times when using the 405nm wavelength
- Alkaline resistance
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Ordyl AM 900
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1.2 (AM 930)
1.6 (AM 940)
2.0 (AM 950)
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- Extremely short exposure times
- Suitable for mixing with wavelengths of 405nm integration and standard UV
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Ordyl FLR 9000
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1.2 (FLR 1030)
1.6 (FLR 1040)
2.0 (FLR 1050)
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- Very short exposure times
- Suitable for mixing with wavelengths of 405nm integration and standard UV
- Very small flake size
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Ordyl AF 200E
Ordyl AF 200 LDI
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0.8 (AF 220E)
1.2 (AF 230E)
1.6 (AF 240E)
2.0 (AF 250E)
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- Excellent adhesion on stainless steel
- Suitable for LDI exposure machines
(AF 200LDI)
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- Chemical Milling
- Electroforming
- ENIG process
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Ordyl NE 500
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0.6 (NE 515)
1.0 (NE 525)
1.6 (NE 540)
2.0 (NE 550)
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- Excellent adhesion to stainless steel
- Very good resistance in ENIG process
- Ultra Fine Line
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Ordyl FP 400
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0.6 (FP 415)
1.0 (FP 425)
1.6 (FP 440)
2.0 (FP 450)
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- Excellent resolution up to 1: 2
(i.e. with 40 µm film thickness can be achieved resolution of 20µm)
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Ordyl FP 700
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0.8 (FP 720)
1.6 (FP 740)
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- Excellent resolution up to 1: 2
(i.e. with 40 µm film thickness can be achieved resolution of 20µm)
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Ordyl P-50000
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4.0 (P50100)
5.0 (P50125)
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- Excellent through cure polymerization even at thicknesses above 100 microns
- Permanent resist for MEMS und Biochips Packaging
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- Permanent resist for MEMS und Biochips Packaging
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Ordyl SY 300
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0.8 (SY 320)
1.6 (SY 330)
2.2 (SY 355)
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- Excellent chemical resistance
- Biocompatible
- Heat resistant
- Good resolution
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